Deposition Simulation

Deposition Simulation uses computational models to predict thin film growth, enabling process optimization before expensive experimental runs.

## What Is Deposition Simulation?

  • Physics: Models surface kinetics, gas transport, plasma chemistry
  • Outputs: Film thickness, uniformity, composition profiles
  • Software: COMSOL, Silvaco ATHENA, Synopsis TCAD
  • Scale: Reactor-level to atomic-level models

## Why Deposition Simulation Matters

A single CVD tool costs $5-20M. Simulation reduces trial-and-error experimentation, accelerating process development and improving uniformity.

Deposition Simulation Hierarchy:Equipment Level: Feature Level:┌─────────────┐ ┌───────────┐│ Gas flow │ │ Surface ││ Temperature │ → │ reactions ││ Pressure │ │ Step ││ Power │ │ coverage │└─────────────┘ └───────────┘ Continuum Kinetic (CFD, thermal) (Monte Carlo)

Simulation Types:
| Model | Physics | Application |
|-------|---------|-------------|
| CFD | Gas dynamics | Uniformity prediction |
| Kinetic MC | Surface reactions | Conformality |
| Plasma model | Ion/radical transport | PECVD/PVD |
| MD | Atomic interactions | Interface quality |

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