InFO (integrated Fan-Out)
Integrated Fan-Out is TSMC's fan-out wafer-level packaging technology that redistributes die I/O to a larger area without a traditional package substrate. First used in Apple's A10 processor (iPhone 7, 2016).
Why Fan-Out?
No substrate: Eliminates the organic package substrate, reducing package height and cost. Shorter interconnects: RDL traces are shorter than substrate routing, improving electrical performance. Thinner package: Total package height < 0.5mm possible. Critical for mobile devices. Better thermal: Die is closer to the board, improving heat dissipation.
InFO Process Flow
Step 1 - Die Placement: Known-good dies placed face-down on temporary carrier with precise spacing. Step 2 - Molding: Epoxy mold compound (EMC) encapsulates dies, creating a reconstituted wafer. Step 3 - Carrier Removal: Temporary carrier debonded, exposing die pads. Step 4 - RDL Formation: Redistribution layers (Cu traces in polymer dielectric) fabricated on the die surface to fan out connections. Step 5 - Ball Drop: Solder balls placed on RDL pads at board-level pitch. Step 6 - Singulation: Reconstituted wafer diced into individual packages.
InFO Variants
• InFO-PoP (Package on Package): Memory package stacked on top. Used in smartphone processors.
• InFO-L (Large): Extended fan-out for larger dies or multi-die integration.
• InFO-SoW (System on Wafer): Multiple chiplets integrated in a single InFO package for HPC applications.
• InFO-3D: Combines fan-out with 3D die stacking for maximum integration density.